Low-pressure high-current pulsed magnetron discharge with electron injection from vacuum arc

Abstract

The results of a study of a pulse-periodic (10–25 Hz, 250–1000 μs) high-current (10–30 A) planarmagnetron discharge with electron injection in the range of ultra-low (up to 2∙10–4 Torr) operatingpressure in argon are presented. The injection of electrons into the cathode layer of the magnetrondischarge was carried out from the back of the target through a central hole. Vacuum arc dischargeplasma was used as an electronic emitter. The use of a vacuum arc discharge as an emitter is due tothe possibility of its operation without additional gas supply. The current of the vacuum arc variedin the range of 10–60 A. Injection of additional high-energy electrons with a current up to 5 Aprovided a shift in the range of operating pressures of the magnetron discharge towards lower pressurevalues. An increase in a burning voltage of the magnetron in an extremely low pressure range,at high-energy electrons supporting, provides a large fraction of metal ions in the magnetron plasmaand a large energy of sputtered atoms. The latter also occurs due to a decrease in the thermalizationof atoms in the drift space due to a decrease in the number of collisions with a decrease in operatingpressure. The properties of deposited metal films in the range of extremely low operating pressure arepresented.