Investigation of the conditions for obtaining SiAlCN coatings by anodic evaporation of Al and decomposition of an organosilicon precursor in a discharge with a self-heating hollow cathode

Abstract

The paper investigates a method for obtaining ceramic PDC coatings by reactive evaporation of aluminum in vapors of an organosilicon precursor in a low-pressure discharge with a self-heating hollow cathode (SHHC). Optical emission spectroscopy was used to study the spectrum of discharge plasma with SHHC under the conditions of Al evaporation in the medium Ar+N2+hexamethyldisilazane (HMDS). SiAlCN coatings with deposition rates up to 11.3 microns/h were obtained. The resulting films had a dense and homogeneous structure and had a hardness of up to 25 GPa and good adhesion on stainless steel samples. The results of SEM and XRD showed that all the necessary elements are present in the composition, and the coatings are X-ray amorphous.