Determination and prediction of temperature in plasma nitriding process substrate

Abstract

To control the ion-plasma nitriding process and reduce the time lost for its prediction, a mathematical model of the influence of external factors on the substrate temperature was developed. In the course of the work, methods of a full factor experiment and a «black box» were applied. The obtained model allows to determine and predict the temperature of the part with an accuracy of 92%. The versatility of the model makes it possible to work with various gas media of the type N-HAr and N-Ar.